Polished Monocrystalline Silicon Wafer
we can customize the material, specifications and optical coating for your optical components based on your needs.
Beschreibung
Description
Monocrystalline silicon wafers are used in the manufacture of microprocessors, memory chips, sensors, solar cells, and other electronic devices. They are essential for the development of advanced electronic devices and offer superior performance compared to other types of wafers.
Description
|
Diameter |
0.2-300mm |
|
Thickness |
0.1-100mm |
|
Dimension tolerance |
+/-0.1mm or +/-0.02mm |
|
Surface quality (scratch & dig) |
60/40, 40/20 or better |
|
Clear aperture |
>85%, >90% |
|
Surface accuracy |
L/10 L/2 L |
|
Parallelism |
+/-3' ,+/-30'' |
|
Bevel |
0.1~0.3mm x 45 degree |
|
Coating |
AR, BBAR or Custom |


Features
Monocrystalline silicon wafer is a silicon substrate material with high purity, complete crystal structure and smooth surface, which has the following characteristics:
High purity: The purity of monocrystalline silicon wafers is very high, usually reaching more than 99.9999%, and it is an extremely pure semiconductor material.
Complete crystal structure: Monocrystalline silicon wafers are silicon crystals grown in a high-temperature furnace. The crystal structure is very complete and has excellent electrical and optical properties.
Smooth surface: The surface of monocrystalline silicon wafers has been polished many times, and the surface is very smooth and flat, which can meet the requirements of high-precision manufacturing.
Strong controllability: the crystal growth direction and lattice structure can be controlled during the growth process of single crystal silicon wafers, so as to obtain silicon wafers of specific shape and size.
Beliebte label: polished monocrystalline silicon wafer
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